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- Title
Photoacoustic measurement of thermal properties of TiN thin films.
- Authors
Irudayaraj, A. Albert; Srinivasan, R.; Kuppusami, P.; Mohandas, E.; Kalainathan, S.; Ramachandran, K.
- Abstract
Titanium nitride (TiN) thin films were prepared by reactive DC magnetron sputtering under different nitrogen flow rates and at constant substrate temperature as well as at constant nitrogen flow rate and at different substrate temperatures. Photoacoustic measurement of the thermal properties of the films revealed that the thermal diffusivity and thermal conductivity of the TiN thin films are significantly lower than the bulk values and that the grain size of the films has substantial influence on the thermal properties of TiN thin films. The thermal conductivity of the films decreases with increasing nitrogen flow rates and increases with increasing substrate temperature. The above opposing behaviour in the thermal properties is found to be related to the microstructure, especially, the grain size of the films.
- Subjects
THIN films; SURFACES (Technology); SURFACE coatings; SOLID state electronics; THICK films; THERMAL properties; TITANIUM compounds; TITANIUM nitride; HEAT conduction; THERMAL diffusivity
- Publication
Journal of Materials Science, 2008, Vol 43, Issue 3, p1114
- ISSN
0022-2461
- Publication type
Article
- DOI
10.1007/s10853-007-2248-8