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- Title
On Decorating a Honeycomb AlN Monolayer with Hydrogen and Fluorine Atoms: Ab Initio and Experimental Aspects.
- Authors
de Almeida Jr., Edward Ferraz; Kakanakova-Georgieva, Anelia; Gueorguiev, Gueorgui Kostov
- Abstract
Mono- and few-layer hexagonal AlN (h-AlN) has emerged as an alternative "beyond graphene" and "beyond h-BN" 2D material, especially in the context of its verification in ultra-high vacuum Scanning Tunneling Microscopy and Molecular-beam Epitaxy (MBE) experiments. However, graphitic-like AlN has only been recently obtained using a scalable and semiconductor-technology-related synthesis techniques, such as metal–organic chemical vapor deposition (MOCVD), which involves a hydrogen-rich environment. Motivated by these recent experimental findings, in the present work, we carried out ab initio calculations to investigate the hydrogenation of h-AlN monolayers in a variety of functionalization configurations. We also investigated the fluorination of h-AlN monolayers in different decoration configurations. We find that a remarkable span of bandgap variation in h-AlN, from metallic properties to nar-row-bandgap semiconductor, and to wide-bandgap semiconductor can be achieved by its hy-drogenation and fluorination. Exciting application prospects may also arise from the findings that H and F decoration of h-AlN can render some such configurations magnetic. We complemented this modelling picture by disclosing a viable experimental strategy for the fluorination of h-AlN.
- Subjects
SCANNING tunneling microscopy; HYDROGEN atom; WIDE gap semiconductors; CHEMICAL vapor deposition; AB-initio calculations; MONOMOLECULAR films
- Publication
Materials (1996-1944), 2024, Vol 17, Issue 3, p616
- ISSN
1996-1944
- Publication type
Article
- DOI
10.3390/ma17030616