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- Title
Deep 3D X-ray Lithography Based on High-Contrast Resist Layers.
- Authors
Naz'mov, V. P.
- Abstract
In classical X-ray lithography, the mask and resist layer are arranged perpendicular to the incident X-ray beam. Being absorbed in the resist layer, the X-ray beam induces a response in the form corresponding to its cross section. However, using a tilt and rotation of the mask/resist and sequential repeated exposures, it is possible to create three-dimensional forms that are accurate to within less than a micron. New approaches to the creation of 3D microstructures by deep X-ray lithography are described, which can ensure the formation of relatively large arrays.
- Subjects
LITHOGRAPHY; ROTATIONAL motion; X-rays
- Publication
Technical Physics Letters, 2019, Vol 45, Issue 9, p906
- ISSN
1063-7850
- Publication type
Article
- DOI
10.1134/S1063785019090256