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- Title
Thin SiC<sub> x </sub> layers prepared by hybrid laser–magnetron deposition.
- Authors
Jelinek, Miroslav; Kocourek, Tomas; Zemek, Josef; Novotný, Michal; Kadlec, Jaromír
- Abstract
Thin SiC x films were fabricated by hybrid laser–magnetron deposition system. KrF excimer laser was used for deposition of carbon and magnetron at the same time for sputtering of Si species. Films were fabricated in argon/hydrogen ambient with and without additional RF discharge. The substrate temperature was changed up to 700°C. Films topology, crystallinity, composition, chemical bonds and optical emission spectra were studied. Films were smooth and amorphous. Films of thickness 400–1000 nm were fabricated. Adhesion moved from 8 to 14 N, depending on deposition conditions.
- Subjects
SILICON carbide; THIN films; PULSED laser deposition; EXCIMER lasers; RADIO frequency
- Publication
Applied Physics A: Materials Science & Processing, 2008, Vol 93, Issue 3, p633
- ISSN
0947-8396
- Publication type
Article
- DOI
10.1007/s00339-008-4727-4