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- Title
Heat sensitive property of sputtered titanium oxide thin films for uncooled IR detector application.
- Authors
Ju, Yongfeng; Wu, Zhiming; Li, Shibin; Li, Lin; Jiang, Yadong
- Abstract
Titanium oxide (TiO) thin films were deposited on thermally grown SiN-film-coated Si substrates by dc reactive magnetron sputtering. The crystallographic structure, microscopic morphology, electrical resistivity, temperature coefficient of resistance (TCR) and activation energy of the films were proven as functions of the oxygen partial pressure ( pO) and substrate temperature ( T). The mixed valence TiO thin films deposited with temperature from 30 to 250 °C in different pO present various electrical properties even though all the samples are amorphous. The TCR and activation energy of the films vary with different pO and T. It has been demonstrated that the sputtered TiO films are promising heat sensitive materials for uncooled Infrared detector application.
- Subjects
TITANIUM dioxide films; INFRARED detectors; MAGNETRON sputtering; ELECTRICAL resistivity; TEMPERATURE coefficient of electric resistance; ACTIVATION energy
- Publication
Journal of Materials Science: Materials in Electronics, 2012, Vol 23, Issue 6, p1188
- ISSN
0957-4522
- Publication type
Article
- DOI
10.1007/s10854-011-0570-z