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- Title
Focussed Helium Ion Beam Exposure of Polymethylmethacrylate: Positive or Negative Tone Images, Polyenes, and Fluorescent Carbon Layers.
- Authors
Walia, Jaspreet; Rashid, Sabaa; Variola, Fabio; Berini, Pierre
- Abstract
Understanding chemical transformations in polymethylmethacrylate (PMMA) during helium ion beam exposure will help researchers involved in nanofabrication, materials synthesis or transformation, patterning polyenes, developing phantoms for radiation therapy, and realizing carbonaceous quantum emitters. The level of conjugation in PMMA can be controlled using a helium ion beam to realize patterns that are suitable for positive tone lithography, polyenes, dye‐like fluorescent materials, and polycyclic aromatic compounds with very similar properties to carbon dots. High‐resolution dose studies employing Raman scattering and atomic force microscopy (AFM) reveal the conditions under which these very different conjugated carbonaceous materials form, their spatial distribution, and dissolution characteristics in common solvents.
- Subjects
HELIUM ions; ION beams; POLYENES; POLYMETHYLMETHACRYLATE; CARBONACEOUS aerosols; POLYCYCLIC aromatic compounds; ATOMIC force microscopy
- Publication
Advanced Engineering Materials, 2023, Vol 25, Issue 14, p1
- ISSN
1438-1656
- Publication type
Article
- DOI
10.1002/adem.202201707