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- Title
Nanopatterning: What diffraction limit?
- Authors
Rodgers, Peter
- Abstract
The article discusses research which showed the possibility to shatter diffraction limit by using two light sources for photolithography. A group of researchers at Massachusetts Institute of Technology (MIT) covered the surface they wanted to pattern with a film of photochromic molecules. The University of Colorado researchers in Boulder used a two-wavelength technique to perform subdiffraction photolithography in an approach based on photo-polymerization. Researchers at the University of Maryland used two lasers to create feature sizes as small as 40nm.
- Subjects
UNITED States; OPTICAL diffraction; PHOTOLITHOGRAPHY; PHOTOCHROMIC materials; WAVELENGTHS; POLYMERIZATION; RESEARCH
- Publication
Nature Nanotechnology, 2009, Vol 4, Issue 5, p280
- ISSN
1748-3387
- Publication type
Article
- DOI
10.1038/nnano.2009.94