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- Title
Microstructure and infrared reflectance modulation properties in DC-sputtered tungsten oxide films.
- Authors
Zhang, Jun; Wang, Xiu-li; Lu, Yuan; Qiao, Ya; Xia, Xin-hui; Tu, Jiang-ping
- Abstract
Tungsten oxide (WO) films were deposited on indium tin oxide glass by reactive DC magnetron sputtering of a tungsten target in an oxygen and argon atmosphere at different substrate temperatures. Infrared reflectance modulation properties of the films were investigated in the wavelength range of 2.5-25 μm. The morphology and structure of the films are strongly dependent on the substrate temperature, and therefore have a great influence on infrared reflectance modulation properties. The charge capacity and diffusion coefficient of H ions in WO films decrease, and the infrared reflectance modulation and color efficiency first increase and then decrease with increasing the deposition temperature. The values achieve a maximum of 40% and 18.5 cm C, respectively, at 9 μm and 250 °C.
- Subjects
TUNGSTEN oxides; THIN films; MAGNETRON sputtering; MICROSTRUCTURE; REFLECTANCE
- Publication
Journal of Solid State Electrochemistry, 2011, Vol 15, Issue 10, p2213
- ISSN
1432-8488
- Publication type
Article
- DOI
10.1007/s10008-010-1224-4