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- Title
Anisotropic Magnetoresistance of Ni Nanorod Arrays in Porous SiO<sub>2</sub>/Si Templates Manufactured by Swift Heavy Ion-Induced Modification.
- Authors
FEDOTOVA, J.; IVANOU, D.; MAZANIK, A.; SVITO, I.; STRELTSOV, E.; SAAD, A.; ZUKOWSKI, P.; FEDOTOV, A.; BURY, P.; APEL, P.
- Abstract
In this work anisotropic magnetoresistance in lianogranular Ni films and Ni lianorods on Si(100) wafer substrates was studied in wide ranges of temperature and magnetic field. To produce Ni films and lianorods we used electrochemical deposition of Ni clusters either directly on the Si substrate or into pores in SiO2 layer on the Si substrate. To produce mesopores in SiO2 layer, SiO2/Si template was irradiated by a scanned beam of swift heavy 350 MeV 197AU26+ ions with a fluence of 5 x 108 cm-2 and then chemically etched in diluted hydrofluoric acid. Pores, randomly distributed in the template have diameters of 100 250 urn and heights about. 400 500 urn. Comparison of temperature dependences of resistance and magnetoresistance in Ni films and n-Si/SiO2/Ni structures with Ni lianorods showed that, tliey are strongly dependent. 011 orientation of magnetic field and current, vectors relative to each other and the plane of Si substrate. Moreover, magnetoresistance values in n-Si/SiO2/Ni nanostructures can be controlled not. only by electric field applied along Si substrate but. also by additionally applied transversal bias voltage.
- Subjects
NANORODS; NICKEL; SILICON oxide; MAGNETIC anisotropy; MAGNETORESISTANCE; HEAVY ions; CHEMICAL templates; ELECTROCHEMICAL analysis
- Publication
Acta Physica Polonica: A, 2015, Vol 128, Issue 5, p894
- ISSN
0587-4246
- Publication type
Conference Paper
- DOI
10.12693/APhysPolA.128.894