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Synthesis and Analysis of SiBCN Films Obtained by Plasma-Enhanced Chemical Vapor Deposition from Triethylaminoborane, Hexamethyldisilazane, and Ammonia.
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- Journal of Structural Chemistry, 2024, v. 65, n. 8, p. 1488, doi. 10.1134/S002247662408002X
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- Article
Nano-Sized Copper Films Prepared by Magnetron Sputtering.
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- Journal of Structural Chemistry, 2023, v. 64, n. 12, p. 2438, doi. 10.1134/S0022476623120156
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- Article
SYNTHESIS FEATURES AND STRUCTURAL CHARACTERIZATION OF CARBON NANOWALLS PREPARED FROM ORGANOBORON COMPOUNDS.
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- Journal of Structural Chemistry, 2022, v. 63, n. 7, p. 1180, doi. 10.1134/S0022476622070125
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DIELECTRIC LAYERS BC<sub>x</sub>N<sub>y</sub>: SYNTHESIS BY THE DECOMPOSITION OF VAPORS OF ORGANOBORON COMPOUNDS, COMPOSITION AND CHEMICAL STRUCTURE.
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- Journal of Structural Chemistry, 2021, v. 62, n. 10, p. 1631, doi. 10.1134/S0022476621100188
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- Article
CHEMICAL STRUCTURE AND FUNCTIONAL PROPERTIES OF AMORPHOUS BORON CARBONITRIDE FILMS.
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- Journal of Structural Chemistry, 2021, v. 62, n. 8, p. 1309, doi. 10.1134/S0022476621080187
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- Article
(Allylamino)silanes: Synthesis, Properties, and Prospects of Use in Producing New Materials.
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- Russian Journal of General Chemistry, 2021, v. 91, n. 10, p. 1957, doi. 10.1134/S1070363221100054
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- Article
Theoretical model for describing degradation of thin hydrogen-containing films.
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- Technical Physics, 1997, v. 42, n. 8, p. 950, doi. 10.1134/1.1258760
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- Article
Synthesis of Zirconium Diboride Films and ZrB<sub>2</sub>/BC<sub>x</sub>N<sub>y</sub> Heterostructures.
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- Inorganic Materials, 2018, v. 54, n. 2, p. 133, doi. 10.1134/S0020168518020152
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- Article
Properties of BC<sub> x</sub>N<sub> y</sub> films grown by plasma-enhanced chemical vapor deposition from N-trimethylborazine-nitrogen mixtures.
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- Inorganic Materials, 2010, v. 46, n. 5, p. 487, doi. 10.1134/S0020168510050092
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- Article
Thermodynamic modeling of BC<sub> x</sub>N<sub> y</sub> chemical vapor deposition from mixtures of N-trimethylborazine and nitrogen.
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- Inorganic Materials, 2009, v. 45, n. 12, p. 1342, doi. 10.1134/S0020168509120061
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- Article
Thermodynamic Modeling of BC<sub>x</sub>N<sub>y</sub> Chemical Vapor Deposition in the B–C–N–H System.
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- Inorganic Materials, 2003, v. 39, n. 4, p. 362, doi. 10.1023/A:1023275631975
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- Article
Chemical Composition of Boron Carbonitride Films Grown by Plasma-Enhanced Chemical Vapor Deposition from Trimethylamineborane.
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- Inorganic Materials, 2003, v. 39, n. 4, p. 366, doi. 10.1023/A:1023227716045
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- Article
Deposition of Films from a Mixture of Hexamethylcyclotrisilazane Vapor and Argon in Inductively Coupled Plasma.
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- Glass Physics & Chemistry, 2019, v. 45, n. 6, p. 525, doi. 10.1134/S108765961906018X
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- Article
Synthesis and Properties of Thin Films Formed by Vapor Deposition from Tetramethylsilane in a Radio-Frequency Inductively Coupled Plasma Discharge.
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- Glass Physics & Chemistry, 2018, v. 44, n. 3, p. 174, doi. 10.1134/S1087659618030124
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- Article
N-bromohexamethyldisilazane: Investigation of properties and thermodynamic simulation of precipitation of thin-layer structures from the vapor phase.
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- Glass Physics & Chemistry, 2011, v. 37, n. 1, p. 60, doi. 10.1134/S1087659611010123
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- Article
Plasma-chemical synthesis of silicon carbonitride films from trimethyl(diethylamino)silane.
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- Glass Physics & Chemistry, 2010, v. 36, n. 4, p. 497, doi. 10.1134/S1087659610040152
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- Article