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- Title
Low-Temperature Plasma-Enhanced Chemical Vapor Deposition of Carbon Films and Their Emission Properties.
- Authors
Vinogradov, A. Ya.; Andronov, A. N.; Kosarev, A. I.; Abramov, A. S.
- Abstract
Carbon films prepared by the plasma-enhanced chemical gas deposition from a mixture of hydrogen and hexane vapor at a substrate temperature of 150-200°C on silicon tip emitters and flat substrates were investigated. Coatings improving the emission efficiency of tip and flat emitters were deposited under various conditions of hydrogen-plasma etching of a growing film. The films deposited on flat substrates and tip emitters had a high optical transparency; a low electrical conductivity; and a polymer-like structure with a high concentration of the C-C sp² bonds differ in electronic structures, carbon-atom surroundings in the lattice, microdensity, and hydrogen content in the film.
- Subjects
PLASMA-enhanced chemical vapor deposition; CARBON compounds spectra
- Publication
Semiconductors, 2001, Vol 35, Issue 6, p669
- ISSN
1063-7826
- Publication type
Article
- DOI
10.1134/1.1379400