We found a match
Your institution may have access to this item. Find your institution then sign in to continue.
- Title
Synthesis and Characterization of Tungsten Nitrido Amido Guanidinato Complexes as Precursors for Chemical Vapor Deposition of WN<sub>x</sub>C<sub>y</sub> Thin Films.
- Authors
Nolan, Michelle M.; Touchton, Alexander J.; Richey, Nathaniel E.; Ghiviriga, Ion; Rocca, James R.; Abboud, Khalil A.; McElwee‐White, Lisa
- Abstract
Tungsten nitrido amido guanidinato complexes of the type WN(NR2)[(NR')2C(NR2)]2 (R = Me, Et; R' = iPr, Cy) were synthesized as precursors for aerosol-assisted chemical vapor deposition (AACVD) of WNxCy thin films. The reaction of tungsten nitrido amido complexes of the type WN(NR2)3 (R = Me, Et) with two equivalents of a carbodiimide R'N=C=NR' (R' = iPr, Cy) resulted in two insertions of a carbodiimide into W-N(amido) bonds, affording bis(guanidinato) amido nitrido tungsten complexes. These compounds were characterized by 14N NMR, indicating distinctive chemical shifts for each type of N-bound ligand. Crystallographic structure determination of WN(NMe2)[(NiPr)2C(NMe2)]2 showed the guanidinato ligands to be non-equivalent. The complex WN(NMe2)[(NiPr)2C(NMe2)]2 was demonstrated to serve as a precursor for AACVD of WNxCy thin films, resulting in featureless, X-ray amorphous thin films for growth temperatures 200-400°C.
- Subjects
TUNGSTEN compounds synthesis; CHEMICAL vapor deposition; NUCLEAR magnetic resonance spectroscopy; THIN film deposition; CRYSTAL structure; CHEMICAL shift (Nuclear magnetic resonance)
- Publication
European Journal of Inorganic Chemistry, 2018, Vol 2018, Issue 1, p46
- ISSN
1434-1948
- Publication type
Article
- DOI
10.1002/ejic.201701225