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- Title
Sputtering Characteristics of Fullerene C[sub 60] Films under Bombardment with 0.1–1-keV Argon Ions and Atoms.
- Authors
Soshnikov, I. P.; Lunev, A. V.; Gaevskiı, M. É.; Rotkina, L. G.; Barchenko, V. T.
- Abstract
The sputtering of fullerene C[sub 60] films under bombardment with Ar[sup +] ions was studied. In thin films, blistering effects related to diffusion of the implanted argon ions along the layer and substrate interface have been found to occur. A threshold behavior was observed for sputtering at ion energies around 0.2 keV, which is much higher than in graphites. It has been shown that dependence of the work function on ion energy can be described in the framework of Zigmund-Falcone's approximation, which takes into account anisotropic effects in cascade collisions, and with Yudin's approximation for the sputtering of elemental materials. The obtained surface binding energy for fullerenes is U[sub s] ... 6.7 eV, which is less than the value for graphites, U[sub s] graph = 7.7 eV.
- Subjects
FULLERENES; SPUTTERING (Physics); ION bombardment
- Publication
Technical Physics, 2000, Vol 45, Issue 6, p766
- ISSN
1063-7842
- Publication type
Article
- DOI
10.1134/1.1259717