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- Title
A Chemical Vapor Deposition Diamond Reactor for Controlled Thin‐Film Growth with Sharp Layer Interfaces.
- Authors
Schätzle, Philip; Reinke, Philipp; Herrling, David; Götze, Arne; Lindner, Lukas; Jeske, Jan; Kirste, Lutz; Knittel, Peter
- Abstract
A Chemical Vapor Deposition Diamond Reactor for Controlled Thin-Film Growth with Sharp Layer Interfaces This allows for sharp doping profiles in diamond thin films as required by diamond quantum technologies. B Diamond Thin-Film Growth b In article 2200351, Philip Schätzle and colleagues present a chemical vapor deposition diamond reactor with sample transfer equipment.
- Subjects
CHEMICAL vapor deposition; DIAMOND thin films; DIAMONDS; JEWELRY stores; CHEMICAL plants
- Publication
Physica Status Solidi. A: Applications & Materials Science, 2023, Vol 220, Issue 4, p1
- ISSN
1862-6300
- Publication type
Article
- DOI
10.1002/pssa.202200351