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- Title
Exploration of the ultimate patterning potential achievable with high resolution focused ion beams.
- Authors
Gierak, J.; Mailly, D.; Hawkes, P.; Jede, R.; Bruchhaus, L.; Bardotti, L.; Prével, B.; Mélinon, P.; Perez, A.; Hyndman, R.; Jamet, J.-P.; Ferré, J.; Mougin, A.; Chappert, C.; Mathet, V.; Warin, P.; Chapman, J.
- Abstract
Controlled and reproducible fabrication of nanostructured materials will he one of the main industrial challenges in the next few years. We have recently proposed exploitation of the nano-structuring potential of a high resolution Focused Ion Beam Tool, to overcome basic limitations of current nano-fabrication techniques. The aim of this article is to present some new routes for material patterning, which benefit from ion-induced local property modifications or damage. In the experiments we describe hereafter an ultra-sham pencil of 30 keV gallium ions is used to tailor the characteristics of several materials at a scale of a few nanometres. The experimental results are then compared to simulations. First, we simulate the control of collisional defects generated in a thin magnetic layer under FIB irradiation. The results explain the stable magnetic structures we have obtained experimentally. This was achieved with a low surface ion dose (1012 to 1014 ions/cm²). In addition we have explored the promising direction of "Bottom-up" or "self-organization" processes using a FIB instrument. We have defined artificial surface defects. These defects created by the impact of an 8-nm FWHM probe were used to pin the diffusion and to organize nanometre-sized gold clusters on a graphite surface.
- Subjects
ION bombardment; ELECTRONS; SEMICONDUCTOR doping; SOLID solutions; ELECTRON emission; DIFFUSION
- Publication
Applied Physics A: Materials Science & Processing, 2005, Vol 80, Issue 1, p187
- ISSN
0947-8396
- Publication type
Article
- DOI
10.1007/s00339-004-2551-z