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- Title
H plasma effect toward AZO/Mo/AZO transparent conductive film.
- Authors
Lin, Tien-Chai; Huang, Wen-Chang; Tsai, Fu-Chun
- Abstract
The hydrogen plasma towards transparent conductive oxide thin films, triple-layered AZO/Mo/AZO (OMO) structure, is studied in the paper. The OMO films are deposited on glass substrates by a co-sputtering process at room temperature. The DC power towards Mo target is constant at 40 W for 30 s and the RF power towards AZO target is 130 W for 6, 8, 10, 13 and 15 min, respectively. The best thin film was obtained at the condition of Mo deposition for 30 s and AZO deposition for 10 min. It shows the figure of merit (FOM) of 2.23 × 10 and sheet resistance of 517.5 Ω/□ on glass substrate, the average transmittance is about 64 %. The FOM value of the OMO film can be improved by the treatment of H plasma at 150 W for 10 min. The improvement is due to the increase of carrier concentration and results in the decrease of the sheet resistance of the film.
- Subjects
MOLYBDENUM compounds; OXIDE coating; HYDROGEN plasmas; SPUTTERING (Physics); EFFECT of temperature on metals
- Publication
Journal of Materials Science: Materials in Electronics, 2015, Vol 26, Issue 1, p498
- ISSN
0957-4522
- Publication type
Article
- DOI
10.1007/s10854-014-2427-8