Back to matchesWe found a matchYour institution may have access to this item. Find your institution then sign in to continue.TitlePECVD and plasma etching at atmospheric pressure by means of a linearly-extended DC arc plasma source.AuthorsDani, Ines; Hopfe, Volkmar; Rogler, Daniela; Lopez, Elena; Mäder, GerritPublicationVakuum in Forschung und Praxis, 2007, Vol 19, Issue S1, p12ISSN0947-076XPublication typeArticleDOI10.1002/vipr.200790035