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- Title
Specific Contact Resistance Measurement of Screen-Printed Ag Metal Contacts Formed on Heavily Doped Emitter Region in Multicrystalline Silicon Solar Cells.
- Authors
Vinod, P.
- Abstract
Multicrystalline silicon (mc-Si) wafers are widely used to develop low-cost high-efficiency screen-printed solar cells. In this study, the electrical properties of screen-printed Ag metal contacts formed on heavily doped emitter region in mc-Si solar cells have been investigated. Sintering of the screen-printed metal contacts was performed by a co-firing step at 725°C in air ambient followed by low-temperature annealing at 450°C for 15 min. Measurement of the specific contact resistance ( ρ) of the Ag contacts was performed by the three-point probe method, showing a best value of ρ = 1.02 × 10 Ω cm obtained for the Ag contacts. This value is considered as a good figure of merit for screen-printed Ag electrodes formed on a doped mc-Si surface. The plot of ρ versus the inverse of the square root of the surface doping level ( N) follows a linear relationship for impurity doping levels N ≥ 10 atoms/cm. The power losses due to current traveling through various resistive components of finished solar cells were calculated by using standard expressions. Cross-sectional scanning electron microscopy (SEM) views of the Ag metal and doped mc-Si region show that the Ag metal is firmly coalesced with the doped mc-Si surface upon sintering at an optimum firing temperature of 725°C.
- Subjects
MEASUREMENT of contact resistance; SILICON solar cells; SILVER; DOPED semiconductors; SILICON wafers; SINTERING; CRYSTALLOGRAPHY
- Publication
Journal of Electronic Materials, 2013, Vol 42, Issue 10, p2905
- ISSN
0361-5235
- Publication type
Article
- DOI
10.1007/s11664-013-2678-9