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- Title
EFFECT OF DEPOSITION PARAMETERS ON STRUCTURE AND MECHANICAL PROPERTIES OF TiB<sub>2</sub>/Si<sub>3</sub>N<sub>4</sub> NANO MULTILAYERS.
- Authors
DONG, L.; LIU, G. Q.; SUN, Y. D.; LIU, M. Y.; LI, D. J.
- Abstract
TiB2/Si3N4 nano multilayers have been synthesized under different deposition parameters related to substrate by ion beam assisted deposition (IBAD). XRD, Nano indenter, profiler, and multi-functional tester for material surface properties were used to characterize the microstructure and mechanical properties of the multilayers. The results indicated a well-defined composition modulation and layer structure of the multilayers. To the multilayers with constant modulation ratio of 15.4:1 and modulation period of 11.8 nm, the multilayer deposited on Al2O3(111) substrate with 38 nm-thick Ti buffer layer at deposition temperature of 225°C revealed the highest hardness (37.4 GPa) and elastic modulus. This hardest multilayer also showed the improved residual stress, friction coefficient, and fracture resistance.
- Subjects
ION bombardment; COLLISIONS (Nuclear physics); IONS; HARDNESS; PROPERTIES of matter
- Publication
International Journal of Modern Physics B: Condensed Matter Physics; Statistical Physics; Applied Physics, 2010, Vol 24, Issue 1/2, p43
- ISSN
0217-9792
- Publication type
Article
- DOI
10.1142/S021797921006396X