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- Title
Design and preparation of poly(aryl ether ketone)/phosphotungstic acid hybrid films with low dielectric constant.
- Authors
Geng, Zhi; Zhang, Shuling; Mu, Jianxin; Jiang, Xu; Huo, Pengfei; Lu, Yaning; Luan, Jiashuang; Wang, Guibin
- Abstract
A material with low dielectric constant was produced using nanoparticle phosphotungstic acid (PWA) modified by the silane coupling agent γ-aminopropyltriethoxysilane (KH-550) dispersed in a poly(aryl ether ketone) containing (3-trifluoromethyl) phenyl side groups (FPEEK) matrix synthesized with (3-trifluoromethyl) phenyl hydroquinone (3FHQ) and 4,4′-difluorobenzophenone. The material was fabricated using solution-blending. Moreover, the dielectric, thermal, and mechanical properties of this material were characterized using a precision impedance analyzer, thermal gravimetric analyzer, and universal tester, respectively. The results indicate that modified PWA ( m-PWA)/FPEEK composites show obvious improvement in the dielectric properties compared to unmodified PWA ( p-PWA)/FPEEK composites. This should be attributed to the good dispersion and compatibility of m-PWA in FPEEK, as proven by scanning electron microscope and wide-angle X-ray diffraction. Besides, m-PWA/FPEEK composites also exhibited the relatively good thermal and mechanical properties. © 2013 Wiley Periodicals, Inc. J. Appl. Polym. Sci., 2013
- Subjects
POLYARYLETHERS; PHOSPHOTUNGSTIC acids; THIN films; PERMITTIVITY; SYSTEMS design; SILANE coupling agents; MECHANICAL properties of polymers
- Publication
Journal of Applied Polymer Science, 2013, Vol 129, Issue 6, p3219
- ISSN
0021-8995
- Publication type
Article
- DOI
10.1002/app.39047