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- Title
Elektrodepozisyon Yöntemiyle Bakır Katkılı Tungsten Oksit (Cu:WO<sub>3</sub>) İnce Filmlerinin Üretilmesi Ve Karakterizasyonu.
- Authors
FIRAT, Yunus Emre
- Abstract
Nanostructured Cu:WO3 thin films were fabricated by electrodeposition technique on indium tin oxide (ITO)-coated glass substrate under room temperature. The choronoamperometric mode was applied to fabricate the films at -0.6 V for 1200 s. Deposition electrolyte was composed of sodium tungstate dihydrate (Na2WO4⸱2H2O), hydrogen peroxide (H2O2), sulphuric acid (H2SO4) and copper chloride (CuCl2). The pH of the solution was adjusted to 2 by H2SO4. Scanning electron microscopy (SEM) was used to examine the surface morphology and the films indicate porous structures. X-ray diffraction (XRD) device was used for crystal structure analysis and the characteristic peaks of Cu:WO3 phase were revealed. Using electrochemical impedance spectroscopy (EIS), the response of Cu:WO3 thin films to the alternating current frequency was measured and the interface resistance (RCT) of the film was obtained as 838.7 ohm.
- Subjects
INDIUM tin oxide; SODIUM tungstate; THIN films; IMPEDANCE spectroscopy; ALTERNATING currents; TUNGSTATES; COPPER chlorides
- Publication
Journal of the Institute of Science & Technology / Iğdır Üniversitesi Fen Bilimleri Enstitüsü Dergisi, 2020, Vol 10, Issue 1, p234
- ISSN
2146-0574
- Publication type
Article
- DOI
10.21597/jist.638601