Back to matchesWe found a matchYour institution may have access to this item. Find your institution then sign in to continue.TitleComparison of etching tools for resist pattern transfer.AuthorsHorn, Mark W.; Hartney, Mark A.; Kunz, Roderick R.PublicationOptical Engineering, 1993, Vol 32, Issue 10, p2388ISSN0091-3286Publication typeArticleDOI10.1117/12.146847