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- Title
Application of polymers to photoresist materials.
- Authors
Soyano, A.
- Abstract
The article offers information on the polymer application in the development of photoresist materials. It mentions that the photoresist which was used in large scale integration (LSI) production lithography indicates a polymer material where radiochemical or photochemical reaction occurs and allows the resist pattern formation. Moreover, it discusses the chronological development of resist materials and lithography from 1970-2010.
- Subjects
POLYMERS; PHOTORESIST materials; LARGE scale integration of circuits; LITHOGRAPHY; PHOTOCHEMISTRY
- Publication
International Polymer Science & Technology, 2012, Vol 39, Issue 5, p47
- ISSN
0307-174X
- Publication type
Article
- DOI
10.1177/0307174X1203900513