Back to matchesWe found a matchYour institution may have access to this item. Find your institution then sign in to continue.TitleNanolayer Patterning Based on Surface Modification with Extreme Ultraviolet Light.AuthorsMoon, S. W.; Jeon, C.; Hwang, H.-N.; Hwang, C.-C.; Song, H. J.; Shin, H.-J.; Chung, S.; Park, C.-Y.PublicationAdvanced Materials, 2007, Vol 19, Issue 10, p1321ISSN0935-9648Publication typeArticleDOI10.1002/adma.200602166