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- Title
Behavior of Some Refractory Hafnium and Tantalum Compounds in Plasma Flows.
- Authors
Baklanova, N. I.; Lozanov, V. V.; Kul'kov, A. A.; Antipov, E. A.; Titov, A. T.
- Abstract
By reacting tantalum or hafnium carbide with iridium in the presence of a small amount of silicon, we have prepared refractory hafnium- and tantalum-containing materials consisting of a mixture of phases: the intermetallic compound MIr3, recrystallized tantalum or hafnium carbide, and iridium silicide. We have studied the behavior of the materials during an exposure to a high-speed plasma flow at a sample surface temperature of 2000°C and demonstrated that, owing to their special microstructure, the absence of pores, and the low oxidation rate of the iridium-containing components, they exhibit a good ablation resistance and that the hafnium system withstands a longer exposure.
- Subjects
PLASMA flow; HAFNIUM compounds; INTERMETALLIC compounds; TANTALUM compounds; TANTALUM; SILICON compounds; HAFNIUM; SURFACE temperature
- Publication
Inorganic Materials, 2019, Vol 55, Issue 3, p231
- ISSN
0020-1685
- Publication type
Article
- DOI
10.1134/S002016851903004X