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- Title
Failure Analysis of Electronic Material Using Cryogenic FIB-SEM.
- Authors
Antoniou, Nicholas
- Abstract
The article focuses on the usefulness of cryogenic focused ion beam (FIB) technology with scanning electron microscope (SEM) for analyzing the failure of compound semiconductors which allows gallium FIB milling at room temperature. It discusses the preparation of transmission electron microscope (TEM) lamella from indium nitride (InN) nanoparticles and mentions the FIB milling and cryogenic SEM in one system allowing in situ "mill and view" at high resolution at cryogenic temperatures.
- Subjects
FOCUSED ion beams; SCANNING electron microscopes; LOW temperature engineering; SEMICONDUCTOR failures; TRANSMISSION electron microscopes; NANOPARTICLES
- Publication
Electronic Device Failure Analysis, 2013, Vol 15, Issue 3, p12
- ISSN
1537-0755
- Publication type
Article
- DOI
10.31399/asm.edfa.2013-3.p012