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- Title
萦酚基酚醒树脂的合成及其在lift-off 光刻胶中的应用.
- Authors
孙小侠; 司树伟; 郑祥飞; 刘敬成; 穆启道
- Abstract
Naphthol phenolic resins NAPR were synthesized through condensation of α-naphthol, m-cresol and formaldehyde, and the free phenolic hydroxyl groups of the resins were modified with BOC groups. IT-IR, ¹H NMR, GPC, and TGA were used to characterize the structure and properties of the resins. Lift-off photoresist was prepared with NAPR-BOC-2 as matrix resin. The resolution, morphology and heat resistance of photoresist were tested, and the maximum resolution of the photoresist was 0. 6 μm, and the heat resistance was up to 130 °C.
- Subjects
PHENOLIC resins; PHOTORESISTS; NAPHTHOL; CONDENSATION; HEAT; HYDROXYL group
- Publication
Imaging Science & Photochemistry, 2020, Vol 38, Issue 4, p609
- ISSN
1674-0475
- Publication type
Article
- DOI
10.7517/issn.1674-0475.200306