We found a match
Your institution may have access to this item. Find your institution then sign in to continue.
- Title
NANOSCALE PERIODICAL STRUCTURES FABRICATED BY INTERFERENCE PHOTOLITHOGRAPHY.
- Authors
Nesterov, S. I.; Myagkov, D. V.; Portnoi, E. L.
- Abstract
The possibility of periodical mask fabrication with elements of minimal size by means of interference photolithography is considered. The method is based on application of striped interference picture of coherent light for photoresist exposition. The investigation of inorganic photoresist based on chalcogenide glass As2S3 reveals high resolution, sufficient contrast and vertical edge of the masks stripe. The influence of exposure dose and development parameters on photoresist profile are analyzed with the help of the method of computer simulation of the development process. The possibility of decreasing the effect of standing light wave by means of additional homogeneous light irradiation is demonstrated. The optimal conditions for minimum size elements fabrication are found, which enables fabrication of periodical grating with a 80-nm-wide line and two-dimensional periodical structures with pillars of 50 nm cross-section.
- Subjects
PHOTOLITHOGRAPHY; PHOTORESISTS; PHOTOMECHANICAL processes; CHALCOGENIDES; GLASS; COMPUTER simulation
- Publication
International Journal of Nanoscience, 2004, Vol 3, Issue 1/2, p59
- ISSN
0219-581X
- Publication type
Article
- DOI
10.1142/S0219581X0400181X