We found a match
Your institution may have access to this item. Find your institution then sign in to continue.
- Title
Effect of Low-Energy Ion-Plasma Treatment on Residual Stresses in Thin Chromium Films.
- Authors
Babushkin, A. S.; Uvarov, I. V.; Amirov, I. I.
- Abstract
Abstract: The results of studying the effect of low-energy argon ion bombardment (~30 eV) on residual mechanical stresses in a thin chromium film are presented. The change in the mean value and stress gradient as a function of the ion bombardment duration was determined by the change in the bend of test micromechanical bridges and cantilevers. A method is proposed for calculating the depth of the stress modification in a film using these structures. It has been established that the long-term ion-plasma treatment at room temperature affects stresses at a depth of more than 100 nm.
- Subjects
RESIDUAL stresses; CHROMIUM films; ION bombardment; PLASMA gases; MICROMECHANICS
- Publication
Technical Physics, 2018, Vol 63, Issue 12, p1800
- ISSN
1063-7842
- Publication type
Article
- DOI
10.1134/S1063784218120228