Invited for the cover of this issue are Pia Sundberg and Maarit Karppinen from the Aalto University, Finland. The cover image shows the deposition cycle of a (Ti-O-C6H4-N=) n-type thin film grown by a combined atomic and molecular layer deposition (ALD/MLD) technique with TiCl4 and 4-aminophenol as precursors.