Back to matchesWe found a matchYour institution may have access to this item. Find your institution then sign in to continue.Title聚焦离子束工艺参数对单像素线刻蚀的影响.Authors李美霞; 施展; 陆熠磊; 王英; 杨明来PublicationSemiconductor Technology, 2024, Vol 49, Issue 9, p818ISSN1003-353XPublication typeArticleDOI10.13290/j.cnki.bdts.2024.09.006