Back to matchesWe found a matchYour institution may have access to this item. Find your institution then sign in to continue.TitleDépôt chimique CVD de silicium dopé in situ au phosphore. Partie 1: Etude expérimentale.AuthorsTounsi, Adnen; Duverneuil, Patrick; Couderc, Jean-Pierre; Scheid, EmmanuelPublicationCanadian Journal of Chemical Engineering, 1996, Vol 74, Issue 6, p941ISSN0008-4034Publication typeArticleDOI10.1002/cjce.5450740618