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- Title
Investigation of NbN and Nb-Si-N Coatings Deposited by Magnetron Sputtering.
- Authors
IVASHCHENKO, V. I.; SCRYNSKYY, P. L.; LYTVYN, O. S.; ROGOZ, V. M.; SOBOL, O. V.; KUZMENKO, A. P.; COMSTA, H.; KARVAT, C.
- Abstract
NbN and Nb-Si-N films were deposited by magnetron sputtering the Nb and Si targets on silicon wafers at various bias voltages, Us. The deposited films were annealed to establish their thermal stability. The films were investigated by atomic force microscope, X-ray diffraction, X-ray photoelect.ron spectroscopy and nanoindentation. The NbN films were nanostructured, and the Nb-Si-N films had a nanocomposite structure, and represented an aggregation of δ-NbNx nanocrystallites embedded into the amorphous S3N4 tissue (nc-δ-NbNx/a-S3N4).
- Subjects
NIOBIUM nitride; MAGNETRON sputtering; SILICON nitride; ATOMIC force microscopy; X-ray photoelectron spectroscopy; NANOCOMPOSITE materials spectra; THIN films spectra; SURFACE coatings
- Publication
Acta Physica Polonica: A, 2015, Vol 128, Issue 5, p949
- ISSN
0587-4246
- Publication type
Conference Paper
- DOI
10.12693/APhysPolA.128.949