We found a match
Your institution may have access to this item. Find your institution then sign in to continue.
- Title
Coating Deposition by Ion-plasma Sputtering of MAX Phase Ti<sub>2</sub>AlC Target.
- Authors
Kuprin, A. S.; Prikhna, T. A.; Reshetnyak, E. N.; Bortnitskaya, M. A.; Kolodiy, I. V.; Belous, V. A .; Dub, S. N.; Ilchenko, A. V.; Sverdun, V. B.
- Abstract
The process of coating deposition by sputtering a target based on the MAX phase Ti2AlC using a gas plasma source has been studied. It has been shown that the MAX phase of Ti2AlC refers to hard-sputtering materials. With an increase in the sputtering energy of Ar+ ions from 400 to 1200 eV, the sputtering coefficient of the target based on the MAX phase increases from 0.2 to 0.7 atom/ion. The obtained values are 1.5 times lower than the sputtering coefficients of the target from titanium. Phase transformations occur on the target surface and are associated with the decay of the MAX phase and the selective sputtering of lighter elements due to the bombardment by Ar+ ions. It was found that the composition of the deposited coatings is significantly affected by the magnitude of the bias potential on the substrate. With increasing potential in the range from 50 to 200 V, the relative aluminum content in the coatings drops sharply, in favor of titanium from Ti:Al 3.5:1 to Ti:Al 48:1. Regardless of the composition, a solid solution (Ti, Al)C is formed in the coatings with a cubic crystal lattice of the NaCl type, a crystallite size of 10-15 nm and an axial type texture. The MAX phase Ti2AlC was not detected in the coatings. Received coatings have high hardness and Young's modulus, which increase with decreasing aluminum concentration in the ranges of 21-30 GPa and 290-340 GPa.
- Subjects
PHASE transitions; SPUTTER deposition; ALUMINUM coatings; COATING processes; ION bombardment
- Publication
Journal of Nano- & Electronic Physics, 2020, Vol 12, Issue 5, p05011-1
- ISSN
2077-6772
- Publication type
Article
- DOI
10.21272/jnep.12(5).05011