We found a match
Your institution may have access to this item. Find your institution then sign in to continue.
- Title
Plasma polymerization of allyltrimethylsilane with single‐filament dielectric‐barrier discharges—Evidence of cationic surface processes.
- Authors
Bröcker, Lars; Winzer, Tristan; Steppan, Nickolas; Benedikt, Jan; Klages, Claus‐Peter
- Abstract
Atmospheric‐pressure plasma‐enhanced film deposition with single‐filament dielectric‐barrier discharges (DBDs) in argon was investigated using allyltrimethylsilane (ATMS) as a precursor. Nonionic deposition in the discharge zone is largely precluded by a rapid cross‐flow of the source gas, containing between 50 and 2000 ppm of ATMS. The performed experimental studies show a surprisingly large deposited film mass per transferred elementary charge between 220 and 540 amu. Film growth experiments, mass‐spectrometric studies, and kinetic considerations led to the conclusion that the deposition process is a cationic surface polymerization, initiated by ions produced in the DBD by energy transfer from long‐lived excited Ar species and propagated by addition of ATMS monomer molecules.
- Subjects
PLASMA polymerization; ADDITION polymerization; ENERGY transfer; POLYMERIZATION; IONS; MONOMERS
- Publication
Plasma Processes & Polymers, 2024, Vol 21, Issue 4, p1
- ISSN
1612-8850
- Publication type
Article
- DOI
10.1002/ppap.202300177