Back to matchesWe found a matchYour institution may have access to this item. Find your institution then sign in to continue.TitleAtmospheric-Pressure Plasmas for Wide-Area Thin-Film Deposition and Etching.AuthorsHopfe, Volkmar; Sheel, David W.PublicationPlasma Processes & Polymers, 2007, Vol 4, Issue 3, p253ISSN1612-8850Publication typeArticleDOI10.1002/ppap.200600202