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- Title
The Growth Behavior of Titanium Boride Layers in α and β Phase Fields of Titanium.
- Authors
Lv, Xiaojun; Hu, Lingyun; Shuang, Yajing; Liu, Jianhua; Lai, Yanqing; Jiang, Liangxing; Li, Jie
- Abstract
In this study, the commercially pure titanium was successfully electrochemical borided in a borax-based electrolyte. The process was carried out at a constant cathodic current density of 300 mA cm and at temperatures of 1123 K and 1223 K (850 °C and 950 °C) for 0.5, 1, 2, 3, and 5 hours. The growth behavior of titanium boride layers in the α phase field of titanium was compared with that in the β phase field. After boriding, the presence of both the TiB top layer and TiB whisker sub-layer was confirmed by the X-ray diffraction (XRD) and scanning electron microscope. The relationship between the thickness of boride layers and boriding time was found to have a parabolic character in both α and β phase fields of titanium. The TiB whiskers showed ultra-fast growth rate in the β phase field. Its growth rate constant was found to be as high as 3.2002 × 10 m s. Besides, the chemical resistance of the TiB layer on the surface of titanium substrate was characterized by immersion tests in molten aluminum.
- Subjects
TITANIUM metallurgy; ELECTROCHEMICAL analysis; BORAX mines &; mining; ELECTROLYTES; X-ray diffraction; SCANNING electron microscopes; THERMAL properties
- Publication
Metallurgical & Materials Transactions. Part A, 2016, Vol 47, Issue 7, p3573
- ISSN
1073-5623
- Publication type
Article
- DOI
10.1007/s11661-016-3510-y