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- Title
Transparence and electrical properties of ZnO-based multilayer electrode.
- Authors
Kuo-Sheng Kao; Shang-Hao Chang; Po-Tsung Hsieh; Chih-Ming Wang; Da-Long Cheng
- Abstract
Three-layered ZnO/Ag–Ti/ZnO structures were prepared using both the sol-gel technique and DC magnetron sputtering. This study focuses on the electrical and optical properties of the ZnO/Ag–Ti/ZnO multilayers with various thicknesses of the Ag–Ti layer. The ZnO thin film prepared by the sol–gel method was dried at 300°C for 3 minutes, and a fixed thickness of 20 nm was obtained. The thickness of the Ag–Ti thin film was controlled by varying the sputtering time. The Ag–Ti layer substantially reduced the electrical resistivity of the sol–gel-sprayed ZnO thin films. The sheet resistance of the Ag–Ti layer decreased dramatically and then became steady beyond a sputtering time of 60 s. The sputtering time of Ag–Ti thin film deposition was determined to be 60 s, taking into account the optical transmittance. Consequently, the transmittance of the ZnO/Ag–Ti/ZnO multilayer films was 71% at 550 nm and 60% at 350 nm. The sheet resistance was 4.2 Ω/sq.
- Subjects
ZINC oxide thin films; MAGNETRON sputtering; THIN films; GELATION; ELECTRICAL resistivity
- Publication
Applied Physics A: Materials Science & Processing, 2009, Vol 96, Issue 2, p529
- ISSN
0947-8396
- Publication type
Article
- DOI
10.1007/s00339-009-5237-8