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- Title
BACUS reveals latest trends in RET, etch, and e-beam.
- Authors
Burggraaf, Pieter
- Abstract
Focuses on some of the reticle enhancement technologies presented at the 20th annual BACUS Symposium on Photomask Technology which was held in September 2000 in Monterey, California. Information on Samsung Electronics' application of KrF lithography; Topic of the papers presented at the event; Details on the ArF lithography of Hyundai Electronics Industries. INSET: A new strong-PSM paradigm: Phase Phirst!.
- Subjects
CALIFORNIA; MONTEREY (Calif.); UNITED States; CONFERENCES &; conventions; HYUNDAI Electronics Industries Co. Ltd.; RETICLES; SAMSUNG Electronics Co. Ltd.
- Publication
Solid State Technology, 2000, Vol 43, Issue 11, p45
- ISSN
0038-111X
- Publication type
Article