Back to matchesWe found a matchYour institution may have access to this item. Find your institution then sign in to continue.TitlePulsed processing by cold plasma, applied to industrial emission control.AuthorsHeesch, E. J. M. Van; Huiskamp, T.; Yan, K.; Beckers, F. J. C. M.; Smulders, H. W. M.; Winands, G. J. J.; Lemmens, R. H. P.; Blom, P. P. M.; Segura, S. Davalos; Hoeben, W. F. L. M.; Paasen, S. V. B. Van; Oorschot, J. J. Van; Bonkestoter, A. G. A.; Brand, M. L. J. Van Den; Hennink, M.; Smulders, R. W. J.; Pemen, A. J. M.; Laan, P. C. T. Van Der; Neuber, Andreas; Pan, Yun-XiangPublicationFrontiers in Chemistry, 2024, p1ISSN2296-2646Publication typeArticleDOI10.3389/fchem.2024.1386055