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- Title
The influence of porous silica substrate on the properties of alumina films studied by X-ray reflection spectroscopy.
- Authors
Konashuk, A.; Sokolov, A.; Drozd, V.; Romanov, A.; Filatova, E.
- Abstract
The structure of alumina (AlO) films of various thicknesses grown by the atomic layer deposition method on porous silica (por-SiO) substrates has been studied using soft X-ray reflection spectroscopy. It is established that the synthesized films are amorphous and that the ratio of Al atoms with tetrahedral and octahedral coordinations in a film depends on its thickness. It can be suggested that thicker AlO films contain a greater proportion of Al atoms with tetrahedral coordination.
- Subjects
POROUS silica; ALUMINUM oxide films; X-ray spectroscopy; MOLECULAR structure; ATOMIC layer deposition; THICKNESS measurement; METALLIC glasses
- Publication
Technical Physics Letters, 2012, Vol 38, Issue 6, p562
- ISSN
1063-7850
- Publication type
Article
- DOI
10.1134/S1063785012060235