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- Title
Investigation of Surface Morphology of Copper-Modified Amorphous Carbon Films.
- Authors
Zvonareva, T. K.; Ivanov-Omskiı, V. I.; Yastrebov, S. G.; Golubok, A. O.; Gorbenko, O. M.; Rozanov, V. V.
- Abstract
A study of the surface morphology of copper-modified amorphous hydrogenated carbon films a-C:H(Cu) by scanning tunnel microscopy (STM) is reported. An algorithm is presented for the digital analysis of STM images to obtain the size distribution function for the longitudinal component of the surface relief. a-C:H(Cu) films were deposited by magnetron co-sputtering of graphite and copper onto two types of substrates: (100) n-Si with a heavily doped surface layer, and Si covered with a chromium layer. A mesoscopic surface structure of crystalline silicon, a chromium layer, and a-C:H(Cu) film has been revealed. A correlation between the structural elements of the film and the substrate is considered and a conclusion is made that inherent grains with characteristic size of 6-8 nm are formed in the film.
- Subjects
METALLIC films; SURFACES (Technology); SCANNING tunneling microscopy
- Publication
Semiconductors, 2001, Vol 35, Issue 2, p230
- ISSN
1063-7826
- Publication type
Article
- DOI
10.1134/1.1349938