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- Title
Leveling mechanism of plasma electrolytic polishing of titanium alloy with aqueous fluoride-type solution.
- Authors
Zhigang Lv; Lishi Wang; Xinbin Hu; Zhixiang Bu; Yuxing Li
- Abstract
It is vital to optimize the processing parameters and reveal the leveling mechanism of various micro-discharges for titanium alloy. In this paper, TC4 titanium alloy was polished within aqueous fluoride-type solution. The polished surface roughness can be reduced from the original Ra 1.13 µm to 0.213 µm with the voltage range of 250-300 V. The process of plasma electrolytic polishing can be divided into three different stages: conventional low voltage electrolysis, vapor gaseous envelope luminescence, and spark micro-discharge. Correspondingly, it appears different colors for the oxidized titanium alloy surface formed with different processing parameters. The mechanism of plasma electrolytic polishing is related with the formation, growth, and loosening of anodic oxides formed on titanium alloy, as well as the final ultrasonic removal of the loosened oxide debris.
- Subjects
ELECTROLYTIC polishing; TITANIUM alloys; AQUEOUS solutions; FLUORIDES; SURFACE roughness
- Publication
International Journal of Electrochemical Science, 2024, Vol 19, Issue 9, p1
- ISSN
1452-3981
- Publication type
Article
- DOI
10.1016/j.ijoes.2024.100749