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- Title
Improving the Processing Efficiency of Femtosecond Laser Sulfur Hyperdoping of Silicon by Diffractive Beam Shaping.
- Authors
Mc Kearney, Patrick; Lebershausen, Ingo; Schäfer, Sören; Paulus, Simon; Kontermann, Stefan
- Abstract
We demonstrate and compare two approaches for reducing processing time for ultrashort pulse laser surface functionalization with application to femtosecond laser hyperdoping of silicon with a laser pulse duration of 800 fs and an irradiation wavelength of 1030 nm. In the first, we use a Gaussian intensity distribution and increase the repetition rate from 1 kHz to 1002 kHz while keeping all other parameters and thus the accumulated fluence constant. We find that the sub-bandgap absorptance of the material, which we take as target measure, decreases above a repetition rate of 250 kHz. This suggests an inherent limitation of this approach. The second approach is characterized by the use of a line-shaped intensity distribution which is achieved by diffractive beam shaping using a phase-only spatial light modulator. This process proves to be suitable for laser hyperdoping of silicon with a 22-fold enhanced area processing rate while maintaining a sub-bandgap absorptance of above 80 %abs.
- Subjects
ULTRASHORT laser pulses; SPATIAL light modulators; ULTRA-short pulsed lasers; FEMTOSECOND lasers; SILICON; LASER pulses; SULFUR
- Publication
Journal of Laser Micro / Nanoengineering, 2023, Vol 18, Issue 2, p72
- ISSN
1880-0688
- Publication type
Article
- DOI
10.2961/jlmn.2023.02.2003