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- Title
N-bromohexamethyldisilazane: Investigation of properties and thermodynamic simulation of precipitation of thin-layer structures from the vapor phase.
- Authors
Rakhlin, V. I.; Nikulina, L. D.; Sysoev, S. V.; Chernyavskii, L. I.; Kosinova, M. L.; Titov, A. A.; Podgorbunskaya, T. A.; Voronkov, M. G.
- Abstract
N-Bromohexamethyldisilazane has been characterized using an elemental analysis and IR, UV, H NMR, C NMR, and Si NMR spectroscopy. The spectral characteristics of the compound have been determined and the saturated vapor pressure has been measured. The thermodynamic simulation of the chemical vapor deposition (CVD) of silicon carbonitride films in the Si-C-N-Br-H system has been performed at low pressures (13.30 and 1.33 Pa) over a wide temperature range (from 400 to 1200 K) with the use of initial gas mixtures of N-bromohexamethyldisilazane with hydrogen and ammonia. The possibility of preparing films of different compositions has been demonstrated and the optimum conditions for deposition of silicon carbonitride coatings of the general composition SiCN have been established.
- Subjects
SILICON carbide; CARBONITRIDING; THERMODYNAMICS; VAPOR pressure; PRECIPITATION (Chemistry)
- Publication
Glass Physics & Chemistry, 2011, Vol 37, Issue 1, p60
- ISSN
1087-6596
- Publication type
Article
- DOI
10.1134/S1087659611010123