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Proposed data acquisition technique for heterodyne interferometers.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2574, doi. 10.1117/12.145359
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- Article
Recent developments of laser optical coatings in Hungary.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2525, doi. 10.1117/12.145356
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- Article
High-speed hybrid optical/digital correlator system.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2608, doi. 10.1117/12.146387
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Evaluation of the imaging properties of holograms recorded in materials of limited spatial resolution.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2539, doi. 10.1117/12.145375
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- Article
Automatic detection of secondary creases in fingerprints.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2616, doi. 10.1117/12.146389
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- Article
Effect of system point spread function, apparent size, and detector instantaneous field of view on the infrared image contrast of small objects.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2598, doi. 10.1117/12.146388
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- Article
Some problems of reconstruction in electron holography.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2593, doi. 10.1117/12.146390
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- Article
Measurement of three-dimensional shapes using Light-in-Flight recording by holography.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2587, doi. 10.1117/12.146386
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- Article
Filter matching for imaging colorimetry.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2578, doi. 10.1117/12.145362
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- Article
Enhanced transmitter linearity for multiple subcarrier optical transmission.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2581, doi. 10.1117/12.145397
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- Article
Comparison of liquid- and vapor-phase silylation processes for 193-nm positive-tone lithography.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2382, doi. 10.1117/12.146843
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- Article
Acid-catalyzed single-layer resists for ArF lithography.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2363, doi. 10.1117/12.145955
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- Article
Investigation of acousto-optic tunable filter parameters for fast spectrometer application.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2569, doi. 10.1117/12.145313
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- Article
Unique interferometer experiment for controlling the theory of relativity.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2563, doi. 10.1117/12.145395
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- Article
New design for a light-scattering airborne particle counter and its applications.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2557, doi. 10.1117/12.145394
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- Article
Difference holographic interferometry: technique for optical comparison.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2548, doi. 10.1117/12.145378
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- Article
Design of multielement acircular waveguide lens systems in anisotropic media.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2510, doi. 10.1117/12.145291
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- Article
Probe construction for measuring ultraviolet-A radiation.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2517, doi. 10.1117/12.145396
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- Article
Micro-optical circuit design using AUTOCAD and finite element analysis.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2522, doi. 10.1117/12.145399
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- Article
Petzval sum in triplet design: trend or optimum value?
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- Optical Engineering, 1993, v. 32, n. 10, p. 2505, doi. 10.1117/12.145376
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- Article
Femtosecond pulse front tilt caused by angular dispersion.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2501, doi. 10.1117/12.145393
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- Article
Tokamak deposition probe analysis by laser ionization spectroscopy.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2487, doi. 10.1117/12.145398
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- Article
Propagation of femtosecond pulses through lenses, gratings, and slits.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2491, doi. 10.1117/12.145386
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- Article
Physical problems of excimer laser cornea ablation.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2481, doi. 10.1117/12.145357
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- Article
Above-threshold multiphoton photoelectric effect of a gold surface.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2476, doi. 10.1117/12.145288
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- Article
Diffusion-relaxed waveguide N<sub>2</sub> lasers.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2464, doi. 10.1117/12.145284
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- Article
High current density small divergence electron beam production by laser-induced various-order multiphoton photoeffect.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2469, doi. 10.1117/12.145285
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- Article
Investigation of far-infrared lasers.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2460, doi. 10.1117/12.145311
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- Article
Optical Engineering in Hungary.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2459, doi. 10.1117/12.163162
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- Article
Projection x-ray lithography with ultrathin imaging layers and selective electroless metallization.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2437, doi. 10.1117/12.146857
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- Article
Thin silicon nitride films to increase resolution in e-beam lithography.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2452, doi. 10.1117/12.145970
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- Article
Proximity effect correction in electron-beam lithography.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2446, doi. 10.1117/12.146859
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- Article
Excimer-laser-produced nanostructures in polymers.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2424, doi. 10.1117/12.155267
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- Article
Krypton fluoride excimer laser for advanced microlithography.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2410, doi. 10.1117/12.145969
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- Article
Holographic mask aligner.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2403, doi. 10.1117/12.145967
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- Article
Laser-induced damage in pellicles at 193 nm.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2421, doi. 10.1117/12.146852
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- Article
Modeling spray/puddle dissolution processes for deep-ultraviolet acid-hardened resists.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2395, doi. 10.1117/12.145968
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- Article
Comparison of etching tools for resist pattern transfer.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2388, doi. 10.1117/12.146847
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- Article
Process techniques for improving performance of positive tone silylation.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2376, doi. 10.1117/12.146858
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- Article
Chemical amplification positive deep ultraviolet resist by means of partially tetrahydropyranyl-protected polyvinyiphenol.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2368, doi. 10.1117/12.145971
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- Article
Understanding focus effects in submicrometer optical lithography: a review.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2350, doi. 10.1117/12.146837
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- Article
Novel alignment technique for O.1-µm lithography using the wafer rear surface and canceling tilt effect.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2344, doi. 10.1117/12.145957
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- Article
Rim phase-shift mask combined with off-axis illumination: a path to O.5λ/numerical aperture geometries.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2337, doi. 10.1117/12.145956
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- Article
Benchmark comparison of i-line, alternating phase-shift masks.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2328, doi. 10.1117/12.147129
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- Article
Microlithography.
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- Optical Engineering, 1993, v. 32, n. 10, p. 2327, doi. 10.1117/12.162626
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- Article
Papers Come in Many Packages!
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- Optical Engineering, 1993, v. 32, n. 10, p. 2325, doi. 10.1117/12.162624
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